Feb 16, 2012 GaSb Substrate Development Program

By admin  -  On 16 Feb, 2012 -  0 comments

IntelliEPI has kicked off the new large diameter GaSb substrate task under a US DoD funded program. This is a multi-year extensive project for IntelliEPI to develop 4in and larger diameter GaSb crystal pulling technology and to improve epi-ready wafer polishing technique with high flatness. IntelliEPI plans to use its new facility in Allex, Texas for this program.